Electron beam lithography (EBL) and laser beam lithography (LBL) systems

Description du marché

A Dedicated EBL tool for fabrication of state of the art nano-scale structures. Contracting authority has a need for high precision and versatile tool which would be extremely useful in preparation of phononic and photonic structures, such as waveguides, gratings and meta-plasmonic structures. The EBL system should have good support for mix-and-match lithography, i.e. well documented procedures for sharing CAD pattern libraries for straightforward implementation in mix-and-match exposures with the LBL system in lot 2. Prior references of supplying comparable systems are required.

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