Plasmako: ccs movpe system - pr743794-2140-w

Description du marché

Fraunhofer IOSB requires a MOCVD system for research into crystal growth processes for special crystals from the III-V compound semiconductor family with a defined pattern of crystal orientation within the crystal. The research project places very high technical demands on the system, as it is designed for the deposition of very thin layers (nanometer or micrometer range). For the planned application, however, layers several millimetres thick must be deposited with outstanding quality, which is why only the most advanced state-of-the-art system can be considered for this purpose.

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