Surface inspection system for defect detection on wafers - PR880078-3220-P

Description du marché

1 piece Surface inspection system for defect detection on wafers. Surface inspection system for the rapid detection of defects on epitaxial (unstructured) wafers. The system should be able to recognize the defect types particles, scratches, topgraphic unevenness (pits) and spots on the wafer surface, classify them according to size and type and indicate the lateral position on a map. The wafer material is based on InP and GaAs substrates on which heterostructures are grown using epitaxial processes (AlInGa)(AsP). The wafers to be examined have a thickness of 350 - 1000µm and a deflection of up to 80µm. The system is to be loaded manually. Options: Service contract 5 years

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